Stacey Bent from Stanford University joins the podcast to talk about Atomic Layer Deposition (ALD), a technique used to modify the composition and properties of surfaces. Since a large fraction of the atoms in nanostructures exist on the surface, ALD has become a quintessential tool for nanotechnologists. In this micro-episode, Stacey explains how ALD got its start, how it works, how the semiconductor industry accelerated its development, and what opportunities lie ahead. (Recorded on October 25, 2017. Edited by Andrew Cannon)